The Rapid Probe Microscope has been designed as a module for integration into either a host tool, for operation in both an air or vacuum environment, or for integration into a dedicated stand-alone platform.


This schematic represents the RPM head integrated onto a platform with an e-beam column. In this example the wafer would shuttle between the e-beam and the probe.

The first implementation of the RPM is in the Zeiss MeRiT® neXT mask repair system. A second integration in a 300mm wafer metrology system is currently in qualification with a leading metrology equipment supplier. In both applications the capabilities of the RPM are combined with e-beam to offer both lateral and vertical hybrid metrology.

A dedicated 300mm wafer stand-alone platform for the RPM is currently in development with introduction planned in 2021.