Feb

Participated in the Semi Technology Unit Global Summit Executive Forum

Dec

Joint development program signed with IMEC.


Sep

WW Tech appointed as exclusive Sales and Service representative for Korea


Aug

Scientech appointed as exclusive Sales and Service representative for Taiwan


Mar

View the video VLSI Research interviews CEO Peter Jenkins on Metrology and Inspection


Feb

Joint presentaion with IMEC at SPIE Advanced Lithography conference

spie advanced lithography

The application of a Rapid Probe Microscope for investigating 1D and 2D structures from EUV Lithography

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The application of a Rapid Probe Microscope RPM) for investigating 1D and 2D structures for EUV lithography. Andrew D. L. Humphris; Alain Moussa; Mirea Dusa; Anne-Laure Charley; Elis Newham; Jenny Goulden; Lei Feng; Christopher Bevis

www.spiedigitallibrary.org/conference-proceedings-of-spie/11325/113251M/The-application-of-a-Rapid-Probe-Microscope-RPM-for-investigating/10.1117/12.2552054.short

A novel high throughput probe microscope

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A novel high throughput probe microscope: for measuring 3D structures, designed for in-line, integrated or standalone operation. A. D. L. Humphris, L. Fen, M. Tedaldi, L. Mudarikwa, D. Ockwell, J. Goulden

www.spiedigitallibrary.org/conference-proceedings-of-spie/11325/113252H/A-novel-high-throughput-probe-microscope--for-measuring-3D/10.1117/12.2551693.short


Jan

Production version of RPM Generation 6 shipped to Japanese partner for qualification.

infinitesima

Customer accptance of first hybrid wafer RPM-SEM system.

Infinitesima announces Peter Jenkins as President and Chief Executive Officer. Glyn Davies continues as Non-Executive Director.

RPM Generation 6 shipped with Japanese partner integrated in state-of-the-art defect review SEM to leading logic manufacturing in the USA for hybrid wafer metrology.

RPM Generation 6 introduced for wafer applications including support for advanced probes for high aspect ratio device structures.

infinitesima
infinitesima

First RPM shipment on Zeiss MeRiT® neXT Mask Repair system

infinitesima

Infinitesima rellocates to new facility in Abingdon.

infinitesima
infinitesima

Joint presentation with SEMATECH at SPIE Advanced Lithography Conference

spie advanced lithography

Probe Microscopy for Metrology of Next Generation Devices. Andrew D. L, Humphris, Bin Zhao, David Bastard, Benjamin Bunday

Probe Microscopy for metrology of next generation devices

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www.spiedigitallibrary.org/conference-proceedings-of-spie/9778/97782L/Probe-microscopy-for-metrology-of-next-generation-devices/10.1117/12.2219035.short

Hybrid Adaptive Mode introduced for high aspect ratio structures.

Infinitesima Ltd announces major RPM design win with Zeiss.

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RPM generation 5: Vacuum RPM system introduced

infinitesima
infinitesima

RPM generation 4: Vacuum mode demonstrated

RPM generation 4: Addition of photo-thermal actiuation for high speed actuation

infinitesima
infinitesima

RPM generation 3: First operational module

RPM generation 2: 1st imaging demonstrator

RPM generation 1: Intereferometer demonstrator completed

Move into first office in Oxford. Team grows to 5 people.

Infinitesima formed as a spin out of University of Bristol Scanning Probe Microscopy by CTO Andrew Humphris.