Infinitesima will be attending SEMICON Korea 2024

COEX, Seoul booth A204

Jan 31 - 2 February 2024

 Linkedin Web Announcement

Infinitesima is pleased to announce the completion of its investment round to expand production of the MetronĀ®3D 300 mm in-line wafer metrology system.

Metron3D 2024 Press Release

Infinitesima are proud to be awarded Great Place to Work certification

Thank you to our colleagues for making this happen

 Screenshot 2023 08 10 104517

We are deeply saddened by the passing of Dr Paul Atherton, our mentor and investor. 
Paul Atherton

Infinitesima announce first customer shipment of their ground-breaking Metron3D in-line probe metrology system, providing improved process control for next generation Semiconductor manufacturing.

System Image small

Infinitesima will be attending SPIE Advanced Lithography and Patterning

San Jose, California, United States

26 February - 2 March 2023

SPIE ALP 2023

Infinitesima will be attending SEMICON Korea 2023

COEX, Seoul booth A210

1-3 February 2023

 wonik investment

From Lab to Fab, Infinitesima to commercialise powerful new methods for semiconductor device characterisation.

wonik investment

Infinitesima secures strategic investment to ramp production of Metron3D

 wonik investment

Infinitesima will be participating at SEMICON Korea between 9-11 February 2022

 HTVD 2021 banner

Infinitesima is proud to announce the launch of Metron3D, the company's first standalone metrology platform aimed at in-line process control applications for the semiconductor industry.

 HTVD 2021 banner

Infinitesima was proud to be selected as one of the Top 40 technology start-up companies in Europe to participate at HTVD21 in Dresden.

 HTVD 2021 banner

Infinitesima are excited to be attending the first NMI Meet & Greet event on 24th November

 IPFA 2021

Infinitesima presented a joint paper with IMEC on SPM tomographic sensing at IPFA 2021 on September 14th

 IPFA 2021

Infinitesima featured in a recent article on the growing need for AFM metrology in semiconductor manufacturing.

semi engineering

Infinitesima will be presenting a joint paper with IMEC on EUV mask metrology on Wednesday, June 9.

Check out the 2021 EUVL Workshop Agenda & Abstract Book

EUVL Workshop 

Read the recent article in Semiconductor Engineering about Next Generation AFM

semi engineering

Infinitesima announces the shipment of RPM-3D to imec for the joint development of 3D tomographic metrology.

Infinitesima will participate in the digital SEMI Technology Unites Global Summit Executive Forum, February 15th - 19th.

Please visit our virtual booth at www.technologyunites.org/about

Infinitesima participated in SPIE Advanced Lithography Conference between 21st - 25th February 2021, and was involved in several research papers.

www.spie.org/conferences-and-exhibitions/advanced-lithography